PDF《Wafergard》

MICROCONTAMINATION CONTROL Wafergard? MAX HT In-line Gas Filters Superior particulate filtration in high-temperature applications Wafergard? MAX HT in-line gas filters offer excellent filtration in high-temperature applications (120?C?200°C [248?C?392°F]) for vaporized materials such as liquid/solid precursors;

TEOS for BEOL, high-k materials for FEOL, and hot N2 purge for wet cleaning/drying.

Wafergard MAX HT in-line gas filter construction consists of a PTFE membrane supported by PFA structures with an electro- polished 316L stainless housing. This durable filter is highly recommended for high-temperature gas filtration semiconductor process equipment applications. APPLICATIONS ― ? Point-of-use filter for CVD tools ? High-temperature applications ? Hot N2 applications FEATURES & BENEFITS ― ? Up to 200°C (392°F) can be used for high-temperature TEOS and high-k applications ? Low differential pressure provides stable and improved material delivery ? Compact form (127 mm [5"] length) fits many existing delivery systems and is easy to design into new systems ? Overall design (148 mm [5.82"]) is a drop-in-replacement for similar filters ? Special baking enables rapid gas delivery startup

2 SPECIFICATIONS ― Materials Membrane PTFE Support PFA Housing 316L stainless steel Removal particle rating ≥0.003 ?m Particle retention ≥99.9999999% @ 25°C (77°F) Initial downstream cleanliness ≤0.03 particles/Liter greater than 0.01 ?m Internal surface finish ≤7 ?in Ra (Ra