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3 arrays were fabricated by high rate sputter deposition (6) onto pre-patterned silicon substrates. Arrays of square Si features of lateral size 50x50 μm2 or 100x100 μm2 , and depth of

100 μm, were prepared by Deep Reactive Ion Etching. Tantalum (100 nm) / neodymium/iron/boron alloy (NdFeB,

35 μm) / tantalum (100 nm) trilayers were deposited at a temperature of 450°C, and annealed at 750°C for

10 min. Such films display out of plane crystallographic texture with remanent magnetization values of up to 1.2 T. The resulting micro-arrays were named S50 and S100 , respectively (Fig. 1A). A conventional high-performance NdFeB square bulk magnet of

1 cm3 generating a low-gradient magnetic field was used for comparison. The arrays and the bulk magnet were placed below thin- bottomed (100 μm) cell culture devices to analyze their effects on cultured cells (Fig. 1B). Experimental Setup THP-1 or MRC-5 cells (ATCC) seeded onto ibidi μ-slides (Munich, Germany) in

120 μl growth medium (RPMI

1640 supplemented with

10 % FCS,

50 U penicillin and

500 μg/ml streptomycin) and kept at

37 °C in a 5% CO2 atmosphere........